IMS Nanofabrication (PRIVATE.IMS)

Overall impact
C (47)

Commentary

IMS Nanofabrication is an average overall performer. With a 'C' rating of 47.3 for overall impact (36th percentile compared to all companies), IMS Nanofabrication ranks 65th out of 73 industry peers, behind JCET Group, SK Hynix, Silex Systems and 61 others, and ahead of Brainchip, Qorvo, SG Micro Corp and 5 others. On top material causes for IMS Nanofabrication's industry (Semiconductors & Semiconductor Equipment), IMS Nanofabrication performs well in Technology Innovation (94.9 score), Racial Justice and Civil Rights (94.9), Technology Innovation (94.9) and 1 other cause where it received an 'A' score and performs poorly in No Poverty (28.5 score), Equal Pay and Opportunity (34.9), Reduced Inequality (28.1) and 19 other causes where it received a 'D' or 'F' score.
Impact
Cause PRIVATE.IMS
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Company
Founded
1985
Employees
600
Sector
Information Technology
Industry
Semiconductors & Semiconductor Equipment
Sub-industry
Semiconductors
SASB industry
Semiconductors
Headquarters
Austria
Share classes
PRIVATE.IMS
More info
Description
Developer of electron-beam lithography tools designed for the fabrication of leading-edge complex masks and templates. The company's electron-beam lithography tools are used to develop and produce key tool components for mask writing and lithography applications, enabling the semiconductor and nanotech industry with cost-effective lithography for a variety of substrates.
Material causes
Ethos considers the following causes material for IMS Nanofabrication, based on its industry sub-industry Semiconductors. Learn more about material causes in our methodology overview.

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This information may not be used for corporate financing purposes (including, without limitation, ESG-linked loans, credit facilities, securities or structured products), as a basis for any financial instruments or products (including, without limitation, passively managed funds and index-linked derivative securities) or other products or services, to verify or correct data in any other compilation of data or index, to create any derivative works, nor to create any other data or index (custom or otherwise), without Ethos' prior written permission.

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