Overall impact
C (50)

Commentary

Atomera is an average overall performer. With a 'C' rating of 50.0 for overall impact (41st percentile compared to all companies), Atomera ranks 52nd out of 72 industry peers, behind Chipmos Technologies, ASE Technology, Summit Wireless Technologies and 48 others, and ahead of Disco Corporation, National Silicon Industry Group, Advanced Micro-Fabrication Equipment China and 17 others. On top material causes for Atomera's industry (Semiconductors), Atomera performs well in Technology Innovation (95.6 score) and performs poorly in Reduced Green House Gas Emissions (15.3 score), Equal Pay and Opportunity (35.4), Conflict Free Mineral Production (34.8) and 4 other causes where it received a 'D' or 'F' score.
Impact
Cause ATOM
Peer rank
Overall impact

Log in to view this information

Impact trend

Change in rating for overall impact

Log in to view this information

Company
Employees
21
Sector
Information Technology
Industry
Semiconductors & Semiconductor Equipment
Sub-industry
Semiconductor Materials & Equipment
SASB industry
Semiconductors
Headquarters
Ca, United States
Share classes
ATOM
Description
Atomera Incorporated engages in the developing, commercializing, and licensing proprietary processes and technologies for the semiconductor industry in North America and Europe. The company's lead technology is the Mears Silicon Technology, a thin film of reengineered silicon that can be applied as a transistor channel enhancement to CMOS-type transistors. Its customers include foundries, integrated device manufacturers, fabless semiconductor manufacturers, original equipment manufacturers, and electronic design automation companies. Atomera Incorporated was formerly known as Mears Technologies, Inc. and changed its name to Atomera Incorporated in January 2016. The company was incorporated in 2001 and is headquartered in Los Gatos, California.
Material causes
Ethos considers the following causes material for Atomera, based on its industry sub-industry Semiconductor Materials & Equipment. Learn more about material causes in our methodology overview.

This information is subject to Ethos' Terms and Conditions, which you can find here.

This information may not be used for corporate financing purposes (including, without limitation, ESG-linked loans, credit facilities, securities or structured products), as a basis for any financial instruments or products (including, without limitation, passively managed funds and index-linked derivative securities) or other products or services, to verify or correct data in any other compilation of data or index, to create any derivative works, nor to create any other data or index (custom or otherwise), without Ethos' prior written permission.

By browsing this site you agree to our use of cookies. Read more.
We use cookies on this site to enhance your user experience. By continuing to browse the site, you are agreeing to our use of cookies. Give me more info.